Design for Manufacturability and Statistical Design: A Constructive ApproachSpringer Science & Business Media, 2007. gada 28. okt. - 316 lappuses Design for Manufacturability and Statistical Design: A Constructive Approach provides a thorough treatment of the causes of variability, methods for statistical data characterization, and techniques for modeling, analysis, and optimization of integrated circuits to improve yield. The objective of the constructive approach developed in this book is to formulate a consistent set of methods and principles necessary for rigorous statistical design and design for manufacturability from device physics to large-scale circuit optimization. The segments of the book are devoted, respectively, to
Design for Manufacturability and Statistical Design: A Constructive Approach presents an overview of the methods that need to be mastered for state-of-the-art design for manufacturability and statistical design methodologies. It is an important reference for practitioners and students in the field of computer-aided design of integrated circuits. |
No grāmatas satura
1.5. rezultāts no 49.
... thickness strongly depends on the local wire density because of chemical-mechanical polishing. The second is that while technology scaling reduces the nominal values of key process parameters, such as effective channel length, our ...
... . 27 2.5 THIN FILM THICKNESS . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 32 2.6 LATTICE STRESS . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 35 2.7 VARIABILITY IN EMERGING DEVICES ...
... thickness growth, primarily determined by the temperature, pressure, and other controllable factors. Historically, scaling made controlling this variability more difficult: while the nominal target values of the key process parameters ...
A Constructive Approach Michael Orshansky, Sani Nassif, Duane Boning. local oxide thickness variation will become significant. For conventional MOSFETs this means that for technologies below 32 nm, Vth variation due to oxide thickness ...
... thickness variation and line edge roughness are likely to be substantial contributors to the variability budget. Until new lithography solutions are adopted in place of the current 192nm exposure systems, gate length (Lgate) variability ...
Saturs
1 | |
BACK END VARIABILITY 43 | 42 |
ENVIRONMENTAL VARIABILITY | 59 |
TEST STRUCTURES FOR VARIABILITY 85 | 84 |
STATISTICAL FOUNDATIONS OF DATA ANALYSIS | 101 |
Design Techniques for Systematic Manufacturability | 124 |
VARIABILITY | 152 |
STATISTICAL CIRCUIT ANALYSIS 167 | 166 |
STATISTICAL STATIC TIMING ANALYSIS | 201 |
LEAKAGE VARIABILITY AND JOINT PARAMETRIC | 239 |
PARAMETRIC YIELD OPTIMIZATION | 251 |
CONCLUSIONS 279 | 278 |
References | 291 |
Index | 309 |
Citi izdevumi - Skatīt visu
Design for Manufacturability and Statistical Design: A Constructive Approach Michael Orshansky,Sani Nassif,Duane Boning Priekšskatījums nav pieejams - 2007 |
Design for Manufacturability and Statistical Design: A Constructive Approach Michael Orshansky,Sani Nassif,Duane Boning Priekšskatījums nav pieejams - 2010 |