Design for Manufacturability and Statistical Design: A Constructive ApproachSpringer Science & Business Media, 2007. gada 28. okt. - 316 lappuses Design for Manufacturability and Statistical Design: A Constructive Approach provides a thorough treatment of the causes of variability, methods for statistical data characterization, and techniques for modeling, analysis, and optimization of integrated circuits to improve yield. The objective of the constructive approach developed in this book is to formulate a consistent set of methods and principles necessary for rigorous statistical design and design for manufacturability from device physics to large-scale circuit optimization. The segments of the book are devoted, respectively, to
Design for Manufacturability and Statistical Design: A Constructive Approach presents an overview of the methods that need to be mastered for state-of-the-art design for manufacturability and statistical design methodologies. It is an important reference for practitioners and students in the field of computer-aided design of integrated circuits. |
No grāmatas satura
1.–5. rezultāts no 17.
... photolithography and CMP. Statistical design, on the other hand, deals with the random sources of variability. Both paradigms must operate within a common framework, and their joint understanding is one of the objectives of this book ...
... Photolithography . . . . . . . . . . . . . . . . . . 16 2.2.3 Impact of Etch . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 20 2.2.4 Line Edge Roughness . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 22 ...
... photolithography and etching. Again, a multitude of factors may contribute, including: stepper induced variations ... photolithography and etch. 2.2.2 Contributions of Photolithography The delayed introduction of new lithographic ...
... photolithography is a major contributor to across-chip linewidth variation. It also leads to other shape distortions. The effect of low k1 is that the optical system has a low-pass filter characteristic, filtering out the high-frequency ...
... photolithography, features on photomasks are scaled exactly on to the wafer by the demagnification of the projection optics (1/M). At large k1, the mask errors arising due to the inability to ideally place the features (b).on the mask ...
Saturs
1 | |
BACK END VARIABILITY 43 | 42 |
ENVIRONMENTAL VARIABILITY | 59 |
TEST STRUCTURES FOR VARIABILITY 85 | 84 |
STATISTICAL FOUNDATIONS OF DATA ANALYSIS | 101 |
Design Techniques for Systematic Manufacturability | 124 |
VARIABILITY | 152 |
STATISTICAL CIRCUIT ANALYSIS 167 | 166 |
STATISTICAL STATIC TIMING ANALYSIS | 201 |
LEAKAGE VARIABILITY AND JOINT PARAMETRIC | 239 |
PARAMETRIC YIELD OPTIMIZATION | 251 |
CONCLUSIONS 279 | 278 |
References | 291 |
Index | 309 |
Citi izdevumi - Skatīt visu
Design for Manufacturability and Statistical Design: A Constructive Approach Michael Orshansky,Sani Nassif,Duane Boning Priekšskatījums nav pieejams - 2007 |
Design for Manufacturability and Statistical Design: A Constructive Approach Michael Orshansky,Sani Nassif,Duane Boning Priekšskatījums nav pieejams - 2010 |