Design for Manufacturability and Statistical Design: A Constructive ApproachSpringer Science & Business Media, 2007. gada 28. okt. - 316 lappuses Design for Manufacturability and Statistical Design: A Constructive Approach provides a thorough treatment of the causes of variability, methods for statistical data characterization, and techniques for modeling, analysis, and optimization of integrated circuits to improve yield. The objective of the constructive approach developed in this book is to formulate a consistent set of methods and principles necessary for rigorous statistical design and design for manufacturability from device physics to large-scale circuit optimization. The segments of the book are devoted, respectively, to
Design for Manufacturability and Statistical Design: A Constructive Approach presents an overview of the methods that need to be mastered for state-of-the-art design for manufacturability and statistical design methodologies. It is an important reference for practitioners and students in the field of computer-aided design of integrated circuits. |
No grāmatas satura
1.–5. rezultāts no 33.
... optical proximity effects cause polysilicon feature sizes to vary depending on the local layout surroundings, while copper wire thickness strongly depends on the local wire density because of chemical-mechanical polishing. The second is ...
... Optical Resolution Limit . . . . . . . . . . . . . . . . . . . . . . . . . . . 128 7.2 PROCESS WINDOW ANALYSIS . . . . . . . . . . . . . . . . . . . . . . . . 134 7.3 OPTICAL PROXIMITY CORRECTION AND SRAFS . . . . . 137 7.4 ...
... optical proximity correction and phase-shift masking to improve the fidelity of manufactured devices. In spite of advances, bordering in many cases on the miraculous, it remains a fact that there is an ever growing gap between device ...
... optical proximity effect. As the transistor feature size gets smaller compared to the wavelength of light used to expose the circuit, the light is affected by diffraction from the features located nearby. As a result, the length of the ...
... optical resolution limit. The variability patterns due to aberrations are highly predictable at the level of the reticle field, and can be accurately described by distinct 2D surfaces. Finally, there also exists an interaction between ...
Saturs
1 | |
BACK END VARIABILITY 43 | 42 |
ENVIRONMENTAL VARIABILITY | 59 |
TEST STRUCTURES FOR VARIABILITY 85 | 84 |
STATISTICAL FOUNDATIONS OF DATA ANALYSIS | 101 |
Design Techniques for Systematic Manufacturability | 124 |
VARIABILITY | 152 |
STATISTICAL CIRCUIT ANALYSIS 167 | 166 |
STATISTICAL STATIC TIMING ANALYSIS | 201 |
LEAKAGE VARIABILITY AND JOINT PARAMETRIC | 239 |
PARAMETRIC YIELD OPTIMIZATION | 251 |
CONCLUSIONS 279 | 278 |
References | 291 |
Index | 309 |
Citi izdevumi - Skatīt visu
Design for Manufacturability and Statistical Design: A Constructive Approach Michael Orshansky,Sani Nassif,Duane Boning Priekšskatījums nav pieejams - 2007 |
Design for Manufacturability and Statistical Design: A Constructive Approach Michael Orshansky,Sani Nassif,Duane Boning Priekšskatījums nav pieejams - 2010 |