Design for Manufacturability and Statistical Design: A Constructive ApproachSpringer Science & Business Media, 2007. gada 28. okt. - 316 lappuses Design for Manufacturability and Statistical Design: A Constructive Approach provides a thorough treatment of the causes of variability, methods for statistical data characterization, and techniques for modeling, analysis, and optimization of integrated circuits to improve yield. The objective of the constructive approach developed in this book is to formulate a consistent set of methods and principles necessary for rigorous statistical design and design for manufacturability from device physics to large-scale circuit optimization. The segments of the book are devoted, respectively, to
Design for Manufacturability and Statistical Design: A Constructive Approach presents an overview of the methods that need to be mastered for state-of-the-art design for manufacturability and statistical design methodologies. It is an important reference for practitioners and students in the field of computer-aided design of integrated circuits. |
No grāmatas satura
1.–5. rezultāts no 51.
... effective channel length, our ability to correspondingly improve manufacturing tolerances, such as mask fabrication errors and mask overlay control, is limited. This results in an increase in the relative amount of variations observed ...
... effective in drastically improving both chip speed and its parametric yield [4]. Another example is the temporal redundancy scheme that allows lower average energy consumption largely without sacrificing performance by implementing a ...
... effective channel length of the CMOS transistors or the interconnect pitch, are being reduced, our ability to improve the manufacturing tolerances, such as mask fabrication and overlay control, is lagging behind [7]. However, the most ...
... effective MOS channel length that can be attributed to intra-chip variation can be up to 35% [18]. A useful distinction that relates to within-chip variability is based on similar structure variability and dissimilar-structure ...
... effective transistor length (Leff), oxide thickness (Tox), threshold voltage (Vth), interconnect width (W) and height (H), and dielectric constant (ρ) [73]. These predictions should be interpreted cautiously, since the ability to ...
Saturs
1 | |
BACK END VARIABILITY 43 | 42 |
ENVIRONMENTAL VARIABILITY | 59 |
TEST STRUCTURES FOR VARIABILITY 85 | 84 |
STATISTICAL FOUNDATIONS OF DATA ANALYSIS | 101 |
Design Techniques for Systematic Manufacturability | 124 |
VARIABILITY | 152 |
STATISTICAL CIRCUIT ANALYSIS 167 | 166 |
STATISTICAL STATIC TIMING ANALYSIS | 201 |
LEAKAGE VARIABILITY AND JOINT PARAMETRIC | 239 |
PARAMETRIC YIELD OPTIMIZATION | 251 |
CONCLUSIONS 279 | 278 |
References | 291 |
Index | 309 |
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Design for Manufacturability and Statistical Design: A Constructive Approach Michael Orshansky,Sani Nassif,Duane Boning Priekšskatījums nav pieejams - 2007 |
Design for Manufacturability and Statistical Design: A Constructive Approach Michael Orshansky,Sani Nassif,Duane Boning Priekšskatījums nav pieejams - 2010 |