Design for Manufacturability and Statistical Design: A Constructive ApproachSpringer Science & Business Media, 2007. gada 28. okt. - 316 lappuses Design for Manufacturability and Statistical Design: A Constructive Approach provides a thorough treatment of the causes of variability, methods for statistical data characterization, and techniques for modeling, analysis, and optimization of integrated circuits to improve yield. The objective of the constructive approach developed in this book is to formulate a consistent set of methods and principles necessary for rigorous statistical design and design for manufacturability from device physics to large-scale circuit optimization. The segments of the book are devoted, respectively, to
Design for Manufacturability and Statistical Design: A Constructive Approach presents an overview of the methods that need to be mastered for state-of-the-art design for manufacturability and statistical design methodologies. It is an important reference for practitioners and students in the field of computer-aided design of integrated circuits. |
No grāmatas satura
1.–5. rezultāts no 74.
... DEPENDENCE . . . . . . . . . . . . 2 1.2 VARIABILITY AND UNCERTAINTY . . . . . . . . . . . . . . . . . . . . . 3 1.3 CHARACTERIZATION VS. MODELING . . . . . . . . . . . . . . . . . . 5 1.4 MODEL TO HARDWARE MATCHING ...
... DEPENDENCE. How is this happening? It is helpful to consider the evolution of the definition of a single device, the simple metal-oxide-semiconductor field-effect transistor (MOSFET) - the workhorse of semiconductor technology. Until ...
... dependence on design. In such a case, the designer has no choice but to perform worst-case analysis, i.e. creating a large enough design margin to correct for the worst possible condition that may occur, or rely on the methods of ...
... dependence of transistor channel length on the device' orientation in the layout is completely systematic and predictable in that we can construct a model of such dependence. If the phenomenon is not modelable because it is poorly ...
... dependence in lithography or micro-loading in resist and etch. The increase of intra-chip parameter variation is caused by the emergence of a number of variation-generating mechanisms located on the interface between the design and ...
Saturs
1 | |
BACK END VARIABILITY 43 | 42 |
ENVIRONMENTAL VARIABILITY | 59 |
TEST STRUCTURES FOR VARIABILITY 85 | 84 |
STATISTICAL FOUNDATIONS OF DATA ANALYSIS | 101 |
Design Techniques for Systematic Manufacturability | 124 |
VARIABILITY | 152 |
STATISTICAL CIRCUIT ANALYSIS 167 | 166 |
STATISTICAL STATIC TIMING ANALYSIS | 201 |
LEAKAGE VARIABILITY AND JOINT PARAMETRIC | 239 |
PARAMETRIC YIELD OPTIMIZATION | 251 |
CONCLUSIONS 279 | 278 |
References | 291 |
Index | 309 |
Citi izdevumi - Skatīt visu
Design for Manufacturability and Statistical Design: A Constructive Approach Michael Orshansky,Sani Nassif,Duane Boning Priekšskatījums nav pieejams - 2007 |
Design for Manufacturability and Statistical Design: A Constructive Approach Michael Orshansky,Sani Nassif,Duane Boning Priekšskatījums nav pieejams - 2010 |