Design for Manufacturability and Statistical Design: A Constructive ApproachSpringer Science & Business Media, 2007. gada 28. okt. - 316 lappuses Design for Manufacturability and Statistical Design: A Constructive Approach provides a thorough treatment of the causes of variability, methods for statistical data characterization, and techniques for modeling, analysis, and optimization of integrated circuits to improve yield. The objective of the constructive approach developed in this book is to formulate a consistent set of methods and principles necessary for rigorous statistical design and design for manufacturability from device physics to large-scale circuit optimization. The segments of the book are devoted, respectively, to
Design for Manufacturability and Statistical Design: A Constructive Approach presents an overview of the methods that need to be mastered for state-of-the-art design for manufacturability and statistical design methodologies. It is an important reference for practitioners and students in the field of computer-aided design of integrated circuits. |
No grāmatas satura
1.–5. rezultāts no 91.
... Figure 2.1 shows a large increase in 3σ variation of effective transistor length (Leff), oxide thickness (Tox), threshold voltage (Vth), interconnect width (W) and height (H), and dielectric constant (ρ) [73]. These predictions should ...
... Figure 2.3. Line shortening refers to the reduction in the length of a rectangular feature. This effect is due to factors that include diffraction, the rounding of the mask patterns themselves, and photoresist diffusion. At low k1 ...
... Figure 2.4 and 2.5 respectively. Lens aberrations may lead to significant systematic spatial non-uniformity of Lgate ... Figure 2.6. This anisotropy also leads to spatial across-reticle maps Lgate that are distinctly different, Figure ...
... Figure 2.8. MEF is a strong function of defocus and exposure errors. Defocus is the vertical displacement of the image plane during illumination. Exposure errors are due to differences in energy delivered by the illumination system, and ...
... Figure 2.9 shows the randomness of the line edge through several steps of the via hole fabrication process. Line edge roughness has impact on all the main electrical device characteristics: the drive current, off-current, and the ...
Saturs
1 | |
BACK END VARIABILITY 43 | 42 |
ENVIRONMENTAL VARIABILITY | 59 |
TEST STRUCTURES FOR VARIABILITY 85 | 84 |
STATISTICAL FOUNDATIONS OF DATA ANALYSIS | 101 |
Design Techniques for Systematic Manufacturability | 124 |
VARIABILITY | 152 |
STATISTICAL CIRCUIT ANALYSIS 167 | 166 |
STATISTICAL STATIC TIMING ANALYSIS | 201 |
LEAKAGE VARIABILITY AND JOINT PARAMETRIC | 239 |
PARAMETRIC YIELD OPTIMIZATION | 251 |
CONCLUSIONS 279 | 278 |
References | 291 |
Index | 309 |
Citi izdevumi - Skatīt visu
Design for Manufacturability and Statistical Design: A Constructive Approach Michael Orshansky,Sani Nassif,Duane Boning Priekšskatījums nav pieejams - 2007 |
Design for Manufacturability and Statistical Design: A Constructive Approach Michael Orshansky,Sani Nassif,Duane Boning Priekšskatījums nav pieejams - 2010 |