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Appendix C

TITLES OF RECENT ION BEAM LABORATORY RESEARCH PAPERS

Ion Implantation in China, by High Carrier Concentration in InP by
Shichang Zou & Xianghuai Liu

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Si* and P* Dual Implantations, by Honglie Shen et al.

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Synthesis of Tantalum Carbide Thin Films by Ion Beam Enhanced Deposition, by Min Zhang et al.

Properties and Structure of Silicon Nitride Films Synthesized by Ion Beam Enhanced Deposition, by Xianghuai Liu et al.

Synthesis of Silicon Nitride Films by Ion Beam Enhanced Deposition and Their Protective Properties Against Oxidation, by Shigeji Taniguchi et al.

A Simulation of Ion Beam Enhanced Deposition of Boron Nitride and Silicon Nitride Films, by Binyao Jiang et al.

Synthesis of Titanium Nitride Films by Ion Beam Enhanced Deposition, by Xi Wang et al.

Formation of Titanium Nitride Films by Xe* Ion Beam Enhanced Deposition in a N, Gas Environment, by Xi Wang et al.

A Preliminary Study on Improving Cutting Tools by Ion Beam Enhanced Deposition, by Zhongchen Zhang et al.

ELECTROTECHNICAL LABORATORY CENTENNIAL HIGHLIGHTS THE FUTURE OF SCIENCE AND TECHNOLOGY

After 100 years of service to the scientific and technological communities,
current Electrotechnical Laboratory (ETL) research shows youthful vigor
and wise direction to complement a long and distinguished track record. Of
particular interest is ETL's effective program for development of compact
synchrotron-radiation x-ray sources for x-ray lithography. This program is
well connected with semiconductor device development projects as well.

BACKGROUND

Located amid a cluster of public and private research centers in Tsukuba Science City, Ibaraki Prefecture, Japan, the Electrotechnical Laboratory (ETL) is celebrating its centennial. ETL was founded in 1891 by the Ministry (then Bureau) of Electrocommunications. In 1952, ETL became affiliated with the Agency of Industrial Science and Technology (AIST), an element of the Ministry of International Trade and Industry (MITI). A major reorganization in 1970 generated the current name and a new focus on conducting research in broad areas including electrical, electronic, and information-processing technologies for the purpose of ensuring technical innovation. The move to Tsukuba (about an hour from Tokyo) in 1979 provided the campus-like setting and the modern facilities. Some historical highlights are shown in the chronology in Table 1.

SCOPE OF THE
RESEARCH PROGRAM

Another major reorganization in 1988 set the current mission as basic

by Victor Rehn

A tabulation of ETL research themes is shown in Table 3. Here the joint programs with the private sector and with other governmental agencies are shown specifically, albeit without associated budget figures. The tremendous breadth of the ETL research program is evident in Table 3: medical and welfare equipment technology, human frontier science program, technologies for global environment, and international joint research projects are notable examples.

research and development (R&D)
pursuant to significant technological,
economic, and social impact, but which
will involve both high risk of failure
and a long lead time before impact.
Currently, this mission is being pur-
sued by about 545 researchers and 678
support persons on an annual budget
of about $77M. By its own count, ETL
is Japan's largest national research
institute. See Figure 1 for budgetary
allocations. One of the events of its
centennial celebration was an elabo-
rate, well-organized, and well-attended
2-day open house. Four major areas of ELECTRONICS RESEARCH
current R&D activities were highlighted
in self-guided laboratory tours:

• Electronics

Self-guiding tours of 12 laboratory exhibits in each research area began in an eighth floor exhibit room and continued sequentially to laboratories

• Standards and Measurement throughout the campus-like ETL Technology

• Energy Technology

• Information Technology

As shown in Table 2, the organization
supports these four research areas
without specific organizational identi-
fication.

complex. Some highlights of fundamental scientific research in the electronics area were:

A high sensitivity Hall device of strained, pseudomorphic Ino.8Gao. 2As/Ino.52Al0.48As/InP (semi-insulating), which demonstrated electron mobility greater than 106 cm2/V-s at 4 K.

Year

Table 1. Chronology of the Electrotechnical Laboratory (ETL)

Event

1876 Insulator Testing Lab, forerunner of ETL.

1891 ETL was established in the Ministry of Communication.

1896 ETL started research on wireless telegraphy.

1936 ETL started research on extra-high voltage power transmission, establishing the foundation for extra-high voltage power transmission in Japan.

1941 The 50th anniversary.

1948 Became part of the Agency of Industrial Science and Technology. The part concerned with communication was transferred to the Nippon Telegraph and Telephone Public Corp. to establish the Electrical Communication Lab.

1958 Nuclear fusion research began.

1959 Development of the first transistor computer with stored program (Mark-IV). 1963 The part concerned with electrical appliances was separated to establish the Japan Electrical Testing Lab.

1964 Elucidation of "phenomenon of resistance minimum" (Kondo effect).

1965 The part concerned with the inspection and testing of electrical meters was separated to establish the Japan Electric Meters Inspection Corp. All effort at ETL to be concentrated on research work.

1966 Large-scale project began.

1970 Reorganized to strengthen activities in the field of electronics.

1978 Moonlight project began.

1979 Moved from Tokyo to Tsukuba Science City to lay the foundation for progress as an updated research organization adapted to the age of internationalization.

1980 Development of the pattern information processing system.

A magnetohydrodynamic power generator, Mark VII, succeeded continuous
operation of more than 200 hours for electric power output of 100 kW.

1981 Key Technology for Future Industries project began.

1988 Reorganized.

1989 World's first Josephson computer, "ETL-JC1, was developed.

1991 Centennial celebration.

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