Laser Induced Damage in Optical Materials: Proceedings of a Symposium Sponsored by the American Society for Testing and Materials and by the National Bureau of StandardsU.S. Department of Commerce, National Bureau of Standards, 1989 |
No grāmatas satura
1.–5. rezultāts no 84.
xxi. lappuse
... level is about correct , since we don't want togo to multiple sessions and wish to have the meeting remain informal and conducive to discussion and openness ( Fig . 3 ) . You might find the nations that have been involved in this ...
... level is about correct , since we don't want togo to multiple sessions and wish to have the meeting remain informal and conducive to discussion and openness ( Fig . 3 ) . You might find the nations that have been involved in this ...
xxii. lappuse
... levels . At our tenth , we had a logo contest and that was the logo that was drawn up by Jerry Bettis then at the Air Force Weapons Lab , now at Rocketdyne . He is here in the audience . We were a lot more staid bunch of people at that ...
... levels . At our tenth , we had a logo contest and that was the logo that was drawn up by Jerry Bettis then at the Air Force Weapons Lab , now at Rocketdyne . He is here in the audience . We were a lot more staid bunch of people at that ...
12. lappuse
... levels far below that required for single pulse intrinsic damage these materials experience irreversible modifications when subjected to a series of laser pulses [ 1-6 ] . The aim of this research is to answer some of the questions ...
... levels far below that required for single pulse intrinsic damage these materials experience irreversible modifications when subjected to a series of laser pulses [ 1-6 ] . The aim of this research is to answer some of the questions ...
13. lappuse
... level it is expected that the material will experience crack or slip plane formation resulting in a nonuniformity in the crystal which acts as a scattering center . It is this scattering which is detected and interpreted as damage . The ...
... level it is expected that the material will experience crack or slip plane formation resulting in a nonuniformity in the crystal which acts as a scattering center . It is this scattering which is detected and interpreted as damage . The ...
16. lappuse
... level to boost the F - center formation efficiency to start the accumulation process , and we see a distinct threshold - like behavior . At higher temperatures the F - center formation rate is large enough ( without being enhanced by ...
... level to boost the F - center formation efficiency to start the accumulation process , and we see a distinct threshold - like behavior . At higher temperatures the F - center formation rate is large enough ( without being enhanced by ...
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Citi izdevumi - Skatīt visu
Bieži izmantoti vārdi un frāzes
absorbing inclusions absorption Alamos approximately BaF2 birefringence Boulder Damage Symposium BRDF CaF2 cavity cerium chamber coefficient crystal curve Damage in Optical damage testing damage threshold defects density dependence deposited detector diameter dielectric dye laser effect electron avalanche emission excimer excimer laser experimental F-center fluence free electron fused silica glass Guenther heating impurities incident increase intensity interface ionization irradiation J/cm² Laboratory laser beam laser damage threshold Laser Induced Damage laser irradiation laser pulse Livermore measured MgF2 mirror morphology multiphoton Nd:YAG nonlinear observed optical coatings Optical Materials P.O. Box parameters particle peak photodiodes photon Phys polished pulse width pump radiation reflectance reflectivity loss reflectors refractive index sample scan scatter shots shown in figure shows SiO2 slab spectra sputtering stress structure substrate surface technique temperature thermal explosion thickness thin films TiO2 transient values wavelength zirconia
Populāri fragmenti
iv. lappuse - Certain commercial equipment, instruments, or materials are identified in this paper in order to adequately specify the experimental procedure. Such identification does not imply recommendation or endorsement by the National Institute of Standards and Technology, nor does it imply that the materials or equipment identified are necessarily the best available for the purpose.
334. lappuse - Laboratory is operated by Battelle Memorial Institute for the US Department of Energy under contract DE-AC0676RLO 1830.