List of Figures Experimental configuration for thermal imaging measurements of optical absorption in thin film coatings. Absorption in dielectric high reflectors designed for operation at 1319 nm measured using thermal imaging and laser calorimetry. Silica substrates with three different aspect ratios were coated and measured using thermal imaging. Emissivities of these films ranged from 0.83 to 0.89. Absorption measured in enhanced metal reflectors designed for operation at 1319 nm measured using thermal imaging and laser calorimetry. Emissivities of these films ranged from 0.05 to 0.09. Absorption measured in dielectric high reflectors designed for operation at 1319 nm measured using thermal imaging and laser calorimetry. Peak absorption levels measured at anomalous sites exceed the average values measured by factors of 10 or more. The sample test format for thermal mapping experiments. Pulsed laser damage testing was performed entirely on the lower half of the part. The upper half was divided into six square centimeter areas for mapping experiments. Thermal imaging maps and scattered light data on three adjacent areas on sample number 4. Thermal anomalies near the edges of each area demonstrate the continuity in the areal maps. Scattering data recorded at 633 nm correlate well only to the large anomalies seen in the thermal imaging data. Thermal imaging maps and scattered light data from area 2 on sample number 2. Many features appear in the two sets of maps but correlation is limited to the largest thermal anomaly which appears in both maps. |