Laser Induced Damage in Optical Materials: Proceedings of a Symposium ...

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30th ANNUAL BOULDER DAMAGE SYMPOSIUM

Proceedings

LASER-INDUCED DAMAGE

IN OPTICAL MATERIALS: 1998

28 SEPTEMBER-1 OCTOBER 1998

BOULDER, COLORADO

Editors

Gregory J. Exarhos
Arthur H. Guenther
Mark R. Kozlowski
Keith L. Lewis
M. J. Soileau

Sponsored by

Center for Research and Education in Optics and Lasers (CREOL)
at the University of Central Florida
Lawrence Livermore National Laboratory

Sandia National Laboratories

Defence Evaluation and Research Agency (UK)
U.S. Air Force Research Laboratory/Phillips Research Site

Cooperating Organizations

Center for High Technology Materials at the University of New Mexico
National Institute of Standards and Technology

Pacific Northwest National Laboratory

SPIE-The International Society for Optical Engineering

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SPIE is an international technical society dedicated to advancing engineering and scientific
applications of optical, photonic, imaging, electronic, and optoelectronic technologies.

SPIE

SERIES

The papers appearing in this book comprise the proceedings of the meeting mentioned on the cover
and title page. They reflect the authors' opinions and are published as presented and without
change, in the interests of timely dissemination. Their inclusion in this publication does not
necessarily constitute endorsement by the editors or by SPIE.

Please use the following format to cite material from this book:

Author(s), "Title of paper," in Laser-Induced Damage in Optical Materials: 1998, Gregory J.
Exarhos, Arthur H. Guenther, Mark R. Kozlowski, Keith L. Lewis, M. J. Soileau, Editors,
Proceedings of SPIE Vol. 3578,
page numbers (1999).

ISSN 0277-786X

ISBN 0-8194-3045-5

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MINI-SYMPOSIUM ON OPTICS FOR THE DEEP UV

Marathon testing of optical materials for 193-nm lithographic applications (Invited Paper)

[3578-67]

V. Liberman, M. Rothschild, J. H. Sedlacek, R. S. Uttaro, MIT Lincoln Lab. (USA); A. K. Bates,
IBM/International SEMATECH (USA); C. K. Van Peski, International SEMATECH (USA)

Measurement and analysis of compaction in fused silica [3578-68]

D. C. Allan, C. Smith, N. F. Borrelli, Corning Inc. (USA)

Dependence of compaction in fused silica on laser pulsewidth at 248 nm (Abstract Only)

[3578-69]

R. L. Sandstrom, R. G. Morton, T. P. Duffey, Cymer Inc. (USA)

1-kHz 5-W ArF excimer laser for microlithography with highly narrow 0.7-pm bandwidth

and issues on durability related to optical damage [3578-70]

T. Enami, T. Ohta, H. Tanaka, H. Kubo, T. Suzuki, F. Sunaka, K. Terashima, A. Sumitani,
Y. Kawasa, O. Wakabayashi, H. Mizoguchi, Komatsu Ltd. (Japan)

DUV laser light sources (Abstract Only) [3578-71]

S. V. Govorkov, R. Willard, Lambda Physik, Inc. (USA)

Characteristics of deep-UV optics at 193 nm and 157 nm [3578-72]

G. P. Callahan, B. K. Flint, Acton Research Corp. (USA)